Study of the mechanical properties of Ti-and Cr-based multicomponent hard coatings
Unbalanced and Closed Field Magnetron Sputtering Processes – Vacuum Technology & Coating Blog
Figure 3 from Magnetron sputtering: a review of recent developments and applications | Semantic Scholar
Applied Sciences | Free Full-Text | Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy | HTML
Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering
Recent advances in magnetron sputtering - ScienceDirect
Schematic of the closed-field unbalanced magnetron sputtering system... | Download Scientific Diagram
Recent advances in magnetron sputtering | Semantic Scholar
feedback Miniature Mortal closed field unbalanced magnetron sputtering - idahoeconomics.com
Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique
MoSx Coatings by Closed-Field Magnetron Sputtering | SpringerLink
Balanced magnetic field in magnetron sputtering systems - ScienceDirect
MoSx Coatings by Closed-Field Magnetron Sputtering | SpringerLink
Schematic drawing of the closed field unbalanced magnetron sputtering... | Download Scientific Diagram
Schematic diagram of the closed field unbalanced magnetron sputtering... | Download Scientific Diagram
Reactive close field unbalance magnetron sputter deposition of titanium dioxides for potential photovoltaic applications
An Overview of Magnetron Sputtering | Stanford Advanced Materials
When is balanced magnetic sputtering used and what is the difference between balanced and unbalanced magnetic sputtering?
Coatings | Free Full-Text | Photocatalytic Properties of Doped TiO2 Coatings Deposited Using Reactive Magnetron Sputtering | HTML
Sputter deposition of Thin Films - ppt download
Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films | Scientific.Net
Influence of magnetic field configuration on plasma characteristics and thin film properties in dual magnetron reactive high power impulse magnetron sputtering discharge with Al in Ar/O2 mixture - ScienceDirect